LÅYER-one
Compact ALD system
- Precursors
- TDMATi, TMA, H₂O
- Vacuum
- Edwards iXH, 100 m³/h
- Footprint
- 2,000 × 2,575 mm
EQUIPMENT RANGE · ALD
Atomic precision, independent of geometry, excellent barriers and endless colours.

Compact ALD system for TiO₂ and Al₂O₃ coatings: self-limiting deposition, layer by layer, conformal coverage even at high aspect ratios, and nanometre-scale thickness control. Ready for production on a 2 × 2.6 m footprint.
Microelectronics and semiconductors, optics and photonics, energy storage and batteries, medical devices, and decorative applications requiring reproducible colours.
Microelectronics and semiconductors, optics and photonics, energy storage and batteries, medical devices, and decorative applications requiring reproducible colours.
One cabinet, one pump, three precursors.
Compact ALD system
| Feature | LÅYER-one |
|---|---|
| Coatings | TiO₂, Al₂O₃ |
| Precursors | TDMATi 300 ml · TMA 300 ml · H₂O 500 ml |
| Primary pump | Edwards iXH, 100 m³/h |
| Valves | DN40 gate valve, two pneumatic DN25 angle valves |
| Pressure measurement | Baratron DN16 (process), Pirani DN16 |
| Cabinet W × H | 800 × 1,810 mm, control panel at 1,474 mm |
| Width including pump | 1,590 mm |
| Footprint | 2,000 × 2,575 mm |
| Connections | Compressed air 5–6 bar, N₂ 2 bar, vacuum, cooling water, network, electricity |
THE NEXT STEP
Describe your parts, throughput and process. We will respond with an assessment, with sample coating and an equipment demonstration on request.